Charged particle beam apparatus

ABSTRACT

A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.

RELATED APPLICATIONS

This application is a Continuation of U.S. application Ser. No.11/699,065, filed on Jan. 29, 2007 now U.S. Pat. No. 7,652,249, claimingpriority of Japanese Patent Application No. 2006-047673, filed on Feb.24, 2006, the entire contents of each of which are hereby incorporatedby reference.

BACKGROUND OF THE INVENTION

The present invention relates a method for determining an uneven surfaceheight and a depression/protrusion of a pattern on a sample or obtainingthree-dimensional information, and more specifically to a methodsuitable for obtaining information of depression/protrusion of a lineand space pattern formed on a semiconductor wafer and an apparatustherefor.

Charged particle beam apparatuses, such as a scanning electronmicroscope, are apparatuses suitable for measuring and observing apattern formed on a semiconductor wafer that is developing towardfurther microfabrication. Conventionally, there is a stereoscopicobservation method as disclosed in JP-A-5-41195 as a method forobtaining three-dimensional information on a sample with a chargedparticle beam apparatus.

The stereoscopic observation method obtains three-dimensionalinformation by taking two oblique stereoscopic images, conductingstereoscopic matching between the two images to find correspondingpoints, and calculating the heights.

And, JP-A-5-175496 discloses a technology that irradiates a beamobliquely onto a pattern on a sample to measure the dimensions of thepattern.

Further, U.S. Pat. No. 6,872,943 B2 discloses a method for determining adepression/protrusion of a pattern by irradiating a beam obliquely.

SUMMARY OF THE INVENTION

In a case where the line and space pattern on a sample is measured forits length with a scanning electron microscope, there is a problem thatit is hard to determine the line and the space if the line and the spacehave almost the equal width, resulting in an error in determination. Asmeans for solving the problem, the stereoscopic observation method ofJP-A-5-41195 may be used.

But, the stereoscopic observation method of JP-A-5-41195 has a problemthat it is hard to obtain an excellent three-dimensional image becauseof problems in an S/N ratio and resolution of an image obtained with thescanning electron microscope, a sample structure and the like.Specifically, if the S/N ratio and resolution are low, it is difficultto find the corresponding points with which the matching between the twoimages is established and consequently there may be obtained a blurredimage in which the matching is not fully achieved. Besides, thestereoscopic observation method also has a problem that its processingtime is long because advanced image processing is required.

And, the technology disclosed in JP-A-5-175496 does not refer to thedetermination of the line and space.

U.S. Pat. No. 6,872,943 B2 also has a problem that the respective imagesdo not match if the beam has a different oblique direction because thebeam is irradiated obliquely.

It is an object of the present invention to determine an uneven surfaceand a depression/protrusion formed on a sample or to obtainthree-dimensional information by a simpler method, and more particularlyto provide a method for determining suitable for depression/protrusiondetermination of a line and space pattern formed on a sample, and anapparatus therefor.

The present invention is as follows. First, a charged particle beam isirradiated onto the sample, and the charged particles emitted from thescanned portion are detected at plural focal positions. And, signalamounts or profiles obtained at the plural focal positions are compared,and an uneven surface or a depression/protrusion state of the scannedportion is determined based on an increase or decrease of the signalamounts or a change in shapes of the profiles.

By configuring as described above, it becomes easy to determine anuneven surface and a depression/protrusion in the charged particle beamimage, and particularly it becomes easy to determine adepression/protrusion state of a pattern such as continuation of similarpatterns such as a line and space pattern. And, the determination of anuneven surface or a depression/protrusion on a sample becomes possiblewithout adopting a complex image processing technology.

Other objects, features and advantages of the invention will becomeapparent from the following description of the embodiments of theinvention taken in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram of a structure overview of a scanning electronmicroscope apparatus of an embodiment of the image processor of theinvention.

FIGS. 2A to 2C are diagrams showing profile waveforms in cases ofobtaining a focus on a protrusion part of a line and pattern sample.

FIGS. 3A to 3C are diagrams showing profile waveforms in cases ofobtaining a focus on a depression part of a line and pattern sample.

FIGS. 4A and 4B show a method for comparing by measuring an outsidehalf-value width and an inside half-value width which are possessed bythe peaks of profile waveforms of a depression/protrusion edge.

FIGS. 5A and 5B show changes in the half-value widths inside and outsideof a protrusion and a depression.

FIG. 6 is a processing flow to use an image obtained by autofocusing.

FIGS. 7A and 7B show a relationship between the focal position and thefocus value (exciting current).

FIGS. 8A and 8B show a method for comparing by measuring a distancebetween a peak of a profile waveform and a peak of a differentialwaveform.

FIGS. 9A and 9B show a method for comparing by measuring a width of aline portion and a width of a space portion.

FIG. 10 is a processing flow to specify a line or space position by thepresent invention to perform length measurement of a line and spaceimage.

FIGS. 11A and 11B show a relationship between the focal position and theprofile waveform of a hole image.

FIG. 12 is a processing flow to perform depression/protrusiondetermination by using an image photographed with a focus valuedifferent by ±ΔF with respect to a focus value determined byautofocusing.

FIG. 13 shows contents of the depression/protrusion determination.

FIG. 14 is a calculation example of the half-value widths on the insideand outside of peaks of a profile waveform at a depression/protrusionedge.

FIG. 15 is a conceptual view up to the calculation of focus evaluationvalues.

FIG. 16 is a diagram showing an example that obtaineddepression/protrusion information is superimposed on a photographedimage.

DESCRIPTION OF THE INVENTION

FIG. 1 is a block diagram of a structure overview of a scanning electronmicroscope apparatus which is an embodiment of the image processor ofthe invention. This scanning electron microscope incorporates anautomatic focusing control function.

In FIG. 1, 101 is a sample stage, 102 is a sample to be photographed onthe sample stage, 104 is a cathode, 105 is a scanning coil, 106 is anelectron lens, 108 is a scanning coil control circuit, and 109 is a lenscontrol circuit.

An electron beam 114 is scanned over the sample 102 by the scanning coil105, and the electrons emitted from the sample 102 are detected by adetector 103. The signal from the detector 103 is amplified by anunshown amplifier. An (amplified) signal S1 from the detector 103 isinput to an AD converter 107 and converted to a digital signal S2. Thedigital signal S2 is input to an image processing processor 110, whereimage processing and extraction of a characteristic amount areperformed, and the results are sent to a control computer 111. Theprocessed image is sent to a display 112 and displayed thereon. Besides,a digital signal waveform (profile) is created from the digital signal.A focus control signal S3 from the control computer 111 is input to thelens control circuit 109 to adjust the exciting current of the lens 106,thereby capable of performing focus control. 113 is input meansconnected to the control computer 111.

In manufacturing a semiconductor device, the electron microscopeapparatus is used to measure the line width of the fine pattern drawn onthe wafer. Here, when the portion on the wafer that is to be measuredfor a line width is a line or a space, it becomes difficult todistinguish if the line and the space have almost the same width, and itis necessary to distinguish them from three-dimensional information.And, it is difficult to judge the top and bottom of an uneven surfacefrom the displayed image only.

The present invention relates to a charged particle beam apparatuscapable of obtaining depression/protrusion information on a line andspace sample by a simple method or determining the top and bottom of anuneven surface, so that it can be applied to the scanning electronmicroscope apparatus of FIG. 1. Of course, it is not limited to them butcan also be applied to other charged particle beam apparatuses such as afocused ion beam system and the like.

An address signal corresponding to a memory location of the image memoryis generated in the control computer 111, converted into analog and thensupplied to the scanning coil 105 via a scanning coil control powersource (not shown). For example, when an image memory is 512×512 pixels,the address signal in an X direction is a digital signal that takes 0through 512 repeatedly, and the address signal in a Y direction is adigital signal that takes 0 through 512 repeatedly which is incrementedby one when the address signal in the X direction reaches from 0 to 512.It is converted to an analog signal.

Since the address of the image memory corresponds to the address of adeflection signal used for scanning with the electron beam, atwo-dimensional image of a deflection area of the election beam by thescanning coil 105 is recorded in the image memory.

Signals in the image memory can be read out sequentially inchronological order by a read-out address generation circuit (not shown)that is synchronized by a read-out clock. The signal read out incorrespondence with the address is subjected to analog conversion tobecome a brightness modulation signal of the display 112.

The image memory is equipped with a function of memorizing images (imagedata) in a superimposing manner (superimposing one image on another) forthe purpose of improving the S/N ratio. For example, images obtained by8 times of the two-dimensional scanning are superimposed and memorizedto form one completed image. In other words, a final image is formed bysuperimposing images formed in one or more units of X-Y scanning. Thenumber of images for forming one completed image (frame integral number)can be set up arbitrarily, and a proper value is set up in view ofconditions such as the secondary electron generation efficiency and thelike. An image that is wished to be acquired finally can also be formedby further superimposing plural images, each of which is formed bysuperimposing plural images. At the time when a desired number of imageshave been memorized or just after that time, blanking of the firstelectron beam may be executed so that inputting information into theimage memory is interrupted.

The sample 102 is placed on the sample stage 101, and the sample 102 canbe moved in two directions (X direction and Y direction) in a planeperpendicular to the electron beam. The apparatus of the embodimentaccording to the present invention is also equipped with a function offorming a line profile based on the detected secondary electrons orreflected electrons. The line profile is formed based on the amount ofdetected electrons when the first electron beam is scannedone-dimensionally or two-dimensionally or based on brightnessinformation of the sample image, etc., and the obtained line profile isused for, for example, dimensional measurement etc. of a pattern formedon the semiconductor wafer.

For the description of FIG. 1, it was described assuming that thecontrol computer was integrated in the scanning electron microscope asone body or had another equivalent form. It should be noted that it isnatural that the control computer is not limited to take such forms andthat a control processor provided separately from the scanning electronmicroscope body section may perform such processing as will be describedin the following. In that case, there become necessary a transmissionmedium that transmits detected signals detected by the secondary signaldetector 103 to the control processor and transmits signals from thecontrol processor to an electron lens, scanning coil, etc. of thescanning electron microscope as well as an input/output terminal toinput/output signals which are transmitted via the transmission medium.

Moreover, a program to execute processing described below may beregistered on a storage medium, and the program may be executed with acontrol processor that has image memory and supplies necessary signalsto the scanning electron microscope.

EXAMPLE 1

FIGS. 2A to 2C show profile waveforms in a case where a protrusion partof a line and pattern sample is in focus. 201 is an irradiated electronbeam, 202 is a cross section of the protrusion of a line and patternsample, and 203, 204 and 205 are profile waveforms obtained from animage. FIG. 2A is a case that a bottom surface is in focus, FIG. 2B is acase that the intermediate between an upper surface and the bottomsurface is in focus, and FIG. 2C is a case that the upper surface is infocus.

When the bottom surface is in focus as shown in FIG. 2A, the profilewaveform has a steep skirt on the outside of the peak and a gentle skirton the inside of the peak as indicated by 203. Meanwhile, in FIG. 2Cthat the upper surface is in focus, the outer skirt of the peak becomesgentle, and the inner skirt of the peak becomes steep. In FIG. 2B, theshape becomes an intermediate of the above two.

FIGS. 3A to 3C show profile waveforms in a case where a depression partof a line and pattern sample is in focus. 301 is an irradiated electronbeam, 302 is a cross section of the depression of the line and patternsample, and 303, 304 and 305 are profile waveforms obtained from animage. FIG. 3A is a case that the bottom surface is in focus, FIG. 3B isa case that the intermediate between the upper surface and the bottomsurface is in focus, and FIG. 3C is a case that the upper surface is infocus.

When the bottom surface is in focus as shown in FIG. 3A, a profilewaveform has a gentle skirt on the outside of the peak and a steep skirton the inside of the peak as indicated by 303. Meanwhile, in FIG. 3Cthat the upper surface is in focus, the skirt on the outside of the peakbecomes steep, and the skirt on the inside of the peak becomes gentle.FIG. 3B shows a shape between the above two. It indicates a tendencyopposite to that of the profile waveform of the protrusion of FIG. 2.

The depression/protrusion shown in FIG. 2A to FIG. 3C can also beassumed as an uneven surface. When a focus is on the bottom surface ofthe uneven surface as shown in FIG. 2A and FIG. 3A, the profile waveformhas a peak with a steep skirt on the bottom surface of the unevensurface and a peak with a gentle skirt on the upper surface of theuneven surface. Meanwhile, when a focus is on the upper surface as shownin FIG. 2C and FIG. 3C, the peak has a gentle skirt on the bottomsurface of the uneven surface and the peak has a steep skirt on theupper surface of the uneven surface.

As shown in FIG. 2A to FIG. 3C, the upper surface and bottom surface ofthe depression and protrusion or the uneven surface have an oppositechange in shape of the profile waveform when the focal position ischanged. This characteristic can be used to perform thedepression/protrusion determination or the uneven surface determinationof a line and space pattern.

Then, a shape change portion to be actually measured will be describedwith reference to FIGS. 4A to 4C, FIGS. 8A and 8B, FIGS. 9A and 9B andFIG. 14. In this embodiment, the half-value width is used as the shapechange portion to be measured, but it is not exclusive, and any portionother than the half value of the peak may be used if a shape change dueto the movement of the focal position can be compared.

First, a calculation example of the inside and outside half-value widthsof the peak of a profile waveform of a depression/protrusion edge willbe described with reference to FIG. 14. 1401 indicates a profilewaveform of a protrusion shape. Two peaks 1403 and 1409 appear incorrespondence with the protrusion edge. The half-value width on theoutside with respect to the peak 1403 is a distance, namely 1407,between the peak position 1403 and a half position 1405 between the peakvalue 1403 and a minimum value 1402 on the outside of the protrusion.Meanwhile, the half-value width on the inside is a distance, namely1408, between the peak position 1403 and a half position 1406 betweenthe peak value 1403 and a minimum value 1404 on the inside of theprotrusion.

Here, the minimum values 1402 and 1408 on the inside and outside are notthe minimum value, but the value of a flat portion, for example, aportion having a continued prescribed value, can also be used.

FIGS. 4A and 4B show a method for measuring and comparing an outsidehalf-value width and an inside half-value width which are possessed bythe peak of a profile waveform of a depression/protrusion edge. FIGS. 4Aand 4B show a case of a protrusion. 401 and 403 are the half-value widthof outsides, and 402 and 404 are the half-value width of insides. FIG.4A shows that the bottom surface is in focus, so that the skirt on theoutside becomes steep, and 401 becomes small. Conversely, the skirt onthe inside becomes gentle, and 402 becomes large. FIG. 4B shows that theupper surface is in focus, so that the skirt on the outside becomesgentle, and 403 becomes large. Conversely, the skirt on the insidebecomes steep, and 404 becomes small. The depression has a tendency ofthe half-value width with respect to the focal position which isopposite to that of the protrusion.

FIGS. 5A and 5B show changes in the half-value widths on the inside andoutside of a protrusion and a depression. 501 and 504 are changes in thehalf-value width on the inside, and 502 and 503 are changes in thehalf-value width on the outside. For the protrusion, when the focalposition is raised from the bottom surface to the upper surface, thehalf-value width (502) on the outside produces the minimum value at (a),and the half-value width (501) on the inside produces the minimum valueat (c). For the depression, it is opposite, and the half-value width(504) on the inside first produces the minimum value at (a′), and thenthe half-value width (503) on the outside produces the minimum value at(c′). Thus, the depression/protrusion determination can be performeddepending on which of the half-value widths on the inside and outsideproduces the minimum value first.

As shown in FIGS. 7A and 7B, the relationship between the focal positionand the focus value (the exciting current) is known from the apparatus,so that control to raise the focal position from the bottom surface tothe upper surface can be conducted easily.

FIGS. 8A and 8B show a method for measuring and comparing a peak of aprofile waveform and an inter-peak distance of a differential waveform.FIGS. 8A and 8B show a case of the protrusion. 801 and 803 areinter-peak distances on the outside, and 802 and 804 are inter-peakdistances on the inside. FIG. 8A shows that the bottom surface is infocus, so that the inter-peak distance on the outside is short, and 801becomes small. Conversely, the inter-peak distance on the inside becomeslong, and 802 becomes large. FIG. 8B shows that the upper surface is infocus, so that the inter-peak distance on the outside becomes long, and803 becomes large. Conversely, the inter-peak distance on the insidebecomes short, and 804 becomes small. The depression has a tendency ofthe inter-peak distance with respect to the focal position which isopposite to that of the protrusion. A relationship between the focalposition and the inter-peak distance becomes a graph similar to that ofa relationship between the focal position and the half-value width ofFIGS. 5A and 5B. Therefore, it becomes possible to perform thedepression/protrusion determination by comparing which of the inter-peakdistances on the inside and outside has the minimum value first.

The shape change portion to be measured can be another portion. Here, amethod for comparing a shape change by measuring the height at aprescribed position of a profile waveform will be described.

When measurement is performed with the focus between upper and bottomsurfaces of a depression/protrusion (corresponding to, for example, acase of measurement using autofocusing described later), the profileshape shown in FIG. 14 can be obtained by measuring a protrusion shape.The shape change can also be determined by measuring a height of thehalf position 1405 between the peak value 1403 of the profile waveformand the minimum value 1402 on the outside of the protrusion and the halfposition 1406 between the peak value 1403 and the minimum value 1404 onthe inside of the protrusion.

When the focal position is on the bottom surface of the protrusion, aheight at coordinates determining the 1405 becomes low, while a heightat coordinates determining the 1406 becomes high. Conversely, when thefocal position is on the upper surface of the protrusion, a height atthe coordinates determining the 1405 becomes high, while a height at thecoordinates determining the 1406 becomes low.

The height of the profile shape can also be called as a signal amount.

Besides, the inclination at the half position 1405 between the peakvalue 1403 of the profile waveform and the minimum value 1402 on theoutside of the protrusion and the inclination at the half position 1406between the peak value 1403 and the minimum value 1404 on the inside ofthe protrusion can also be subjected to the measurement.

When the focal position is on the bottom surface of the protrusion, theinclination at the coordinates determining the 1405 becomes steep, whilethe inclination at the coordinates determining the 1406 becomes gentle.Conversely, when the focal position is on the upper surface of theprotrusion, the inclination at the coordinates determining the 1405becomes gentle, while the inclination at the coordinates determining the1406 becomes steep.

Here, the inclination of the profile waveform can also be called as asignal change.

Besides, the sum of signal amounts from the position 1405 to the peakvalue 1403 of the profile waveform and the sum of signal amounts fromthe position 1406 to the peak value 1403 may be subjected to themeasurement.

When the focal position is on the bottom surface of the protrusion, thesum of signal amounts from the coordinates determining the 1405 to thepeak value 1403 becomes small, while the sum of signal amounts from thecoordinates determining the 1406 to the peak value 1403 becomes large.Conversely, when the focal position is on the upper surface of theprotrusion, the sum of signal amounts from the coordinates determiningthe 1405 to the peak value 1403 becomes large, while the sum of signalamounts from the coordinates determining the 1406 to the peak value 1403becomes small.

In this embodiment, the position of the portion to which the half-valuewidth is given is used as the shape change portion to be measured, butany position other than the position of the half of the peak can be usedif the shape changes can be compared.

As the shape change portions to be measured, a plurality of them wasdescribed above, but they can be combined to perform thedepression/protrusion determination with excellent accuracy.

The above embodiment was described on the depression/protrusiondetermination, and it can also be applied to the determination of anuneven surface. As described above, the upper surface and the bottomsurface of an uneven surface have a different change in shape of aprofile waveform when the focal position is changed. The shape change isread from, for example, the half-value width, the height (signal amount)at a prescribed position, the inclination, the sum of signal amounts,and the like similar to the depression/protrusion determination, and thetop and bottom of the uneven surface can be determined.

FIGS. 9A and 9B show a method for measuring and comparing the width of aline portion and the width of a space portion. 901 is a line portion,and 902 is a space portion. 903 and 905 are the widths of line portions,and 904 and 906 are the widths of space portions. For example, a heightwhich determines these two widths is determined at a half of the peakheight of a profile waveform. FIG. 9A shows that the focus is on thebottom surface, so that the space portion has a long width, and 904becomes large. Conversely, the line portion has a short width, and 903becomes small. FIG. 9B shows that the focus is on the upper surface, sothat the space portion becomes short, and 906 becomes small. Conversely,the line portion has a long width, so that 905 becomes large.

A relationship between the focal position and the widths of the line andspace portions becomes a graph similar to that of the relationshipsbetween the focal positions and the half-value widths of FIGS. 5A and5B. Therefore, the depression/protrusion determination becomes possibleby comparing which of the widths of the line and space portions has theminimum value first.

By using the respective methods shown in FIGS. 4A and 4B, FIGS. 8A and8B, FIGS. 9A and 9B and FIG. 14, it becomes possible to calculate thefocus value of the bottom surface or the upper surface of the in-focusstate from the minimum value of the respective measured values, and thefocus values of the top and bottom surfaces of the in-focus state can beobtained simultaneously when the depression/protrusion determination orthe uneven surface determination is performed.

FIG. 10 is a processing flow of a case that the present invention isused to specify the position of a line or a space to measure its lengthon a line and space image. Measurement conditions of a scanning electronmicroscope (SEM) are set up in 1001, and a focus value is set up in1002. An image is photographed in 1003, and a profile waveformequivalent to the depression/protrusion portion is calculated in 1004.To calculate the profile waveform, several lines may be added up. In1005, the half-value widths on the inside and outside of the peakportion of a profile waveform are measured as shown in FIGS. 4A and 4B.This processing is performed plural times with the focus value (thefocal position) varied in 1006. The minimum values of the half-valuewidths on the inside and outside and the focal position at that time arecalculated in 1007. The depression/protrusion is determined by comparingthe focal position having the minimum value in 1008. Sections of 1005and 1007 are based on the method for depression/protrusiondetermination. FIG. 10 indicates the method shown in FIGS. 4A and 4B,and in a case that it indicates the method shown in FIGS. 8A and 8B, thepeak of a profile waveform and the inter-peak distance of a differentialwaveform are calculated in 1005 and the minimum value and the focalposition are compared in 1007. In a case that it indicates the methodshown in FIGS. 9A and 9B, the width of a line part and the width of aspace part are calculated in 1005, and the minimum value and the focalposition are compared in 1007. Finally, to detect the position, thecoordinates of the protrusion part for the line portion and thecoordinates of the depression part for the space portion are output in1009. Here, if plural depression/protrusion parts are detected, thecoordinates closest to the middle may be output.

[Embodiment 2]

For a portion that plural images are photographed with a focus changed,it is also possible to use an autofocus adjusting portion which is usedfor ordinary photographing. FIG. 6 shows a processing flow using animage obtained by autofocusing. Use of the image obtained byautofocusing eliminates the necessity of separately obtaining an imagewith the focus changed, so that the whole processing time can bedecreased accordingly.

Here, the autofocusing is described with reference to FIG. 15. Theexciting current is varied from F1 to Fn to change the focal position,and corresponding images G1 to Gn are obtained. Then, the images G1 toGn are subjected to an operation of a filter for focus evaluation(differentiation, secondary differentiation, Sobel, Laplacian, etc.),respectively, to form focus evaluation images Gf1 to Gfn, and focusevaluation values FE1 to FEn are calculated. Here, as the focusevaluation value, a sum of all pixel values of the focus evaluationvalue image, its average, its variance, etc. can be used. The process upto this step is normally executed as autofocusing, and the excitingcurrent value with the focus evaluation values FE1 to FEn at the maximumis assumed as the exciting current in an in-focus state.

FIG. 12 is a processing flow to perform the depression/protrusiondetermination by using an image photographed with a focus valuedifferent by ±ΔF for a focus value determined by autofocusing.

1201 to 1203 are the same processes as those for obtaining an ordinaryimage, and photographing is performed in 1203 with the focus value ofthe in-focus state obtained by the autofocusing of 1202. In 1204,photographing is performed with a value having the focus value changedfrom the in-focus point by +ΔF, and in 1205, photographing is performedwith a value having the focus value changed from the in-focus point by−ΔF. In 1206 and 1207, the images photographed in 1203, 1204 and 1205are determined for the half-value width on the outside of the peak andthe half-value width on the inside of a profile waveform according tothe methods described with reference to FIGS. 4A and 4B and FIGS. 8A and8B. In the next 1208, depression/protrusion determination is performedaccording to the judged contents shown in FIG. 13, and the positiondetection is performed in 1209 according to the determineddepression/protrusion.

Here, the contents of the depression/protrusion determination shown inFIG. 13 will be described. The focus value (AF) determined byautofocusing in 1202 of FIG. 12 is present at a position between (a) to(c) ((a′) to (c′)) of FIG. 3B for the depression/protrusion shapes shownin FIG. 2A to FIG. 3C. In other words, when it is assumed that the focusvalues of (a) and (c) are a and c (focus values of (a′) and (c′) are a′and c′), the focus value (AF) determined by autofocusing is present in arange of a≦AF≦c (a′≦AF≦c′).

For example, in a case of a<AF<c, when a protrusion shape isphotographed with the focus value determined as AF+ΔF, for the imagephotographed by AF, the half-value width on the outside of the peak of aprofile waveform increases and the half-value width on the insidedecreases in view of the relationships of FIGS. 5A and 5B. Conversely,when photographing is performed with AF-ΔF, the half-value width on theoutside of the peak of the profile waveform decreases, and thehalf-value width on the inside increases.

When a depression shape is photographed with the focus value determinedas AF+ΔF, for the image photographed by AF, the half-value width on theoutside of the peak of the profile waveform decreases and the half-valuewidth on the inside increases in view of the relationships of FIGS. 5Aand 5B. Conversely, when photographing is performed with AF-ΔF, thehalf-value width on the outside of the peak of the profile waveformincreases, and the half-value width on the inside decreases.

Thus, the half-value widths on the inside and outside of the peaks ofthe profile waveforms with AF+ΔF and AF-ΔF are different in tendency toincrease/decrease depending on the depression/protrusion shapes. Use ofthis characteristic makes it possible to perform thedepression/protrusion determination.

AF=a and AF=c show the same tendency with one of the focus values AF+ΔFand AF-ΔF but also show an opposite tendency with the other focus value,so that it becomes possible to perform the depression/protrusiondetermination in the same manner as the case of a<AF<c.

And, as apparent from the relationship shown in FIG. 13, when theautofocus value is in a<AF<c, the depression/protrusion determinationcan be performed by comparing the half-value widths on the inside andoutside of the peak of the profile waveform by photographing with one ofAF+ΔF or AF-ΔF.

The relationships of FIG. 13 can also be installed as a template in theapparatus.

[Embodiment 3]

FIG. 16 is an example showing the obtained depression/protrusion profilesuperimposed on a photographed image.

In this embodiment, the depression/protrusion determination of the lineand space is performed by calculating the focus evaluation values ofportions corresponding to a line and a space from an image obtained byautofocusing and determining a focal length from the exciting current atthe time of the in-focus state to obtain depression/protrusioninformation of the image from the obtained values. Therefore, thedepression/protrusion information can be obtained by a simple methodwithout using complex image processing such as matching processing. And,the obtained depression/protrusion information is used for the positiondetermination, so that a specific error of length measurement points inthe line and space image can be reduced. And, this depression/protrusioninformation can be used for pattern matching.

Besides, since necessary information can be collected at the timing ofautofocusing, it is not necessary to introduce a new process forobtaining the information of the depressions and protrusions at othertiming, and hence this method can contribute to improvement ofthroughput.

In a case where a length of a line or space width is measured, theposition specification as shown in FIG. 10 is important, but the focalposition also becomes important. The line width or the space width isdifferent depending on the focal positions as shown in FIGS. 9A and 9B.Therefore, when it is desired to measure the upper surface width bydetermining the focus values of the upper surface and bottom surface ofthe in-focus state by the method of the present invention, the focusvalue of the upper surface of the in-focus state is used to photographan image, and when it is desired to measure the bottom surface width,the focus value of the bottom surface of the in-focus state is used tophotograph an image, thereby leading to improvement of lengthmeasurement accuracy.

[Embodiment 4]

The embodiments of the present invention were described above inconnection with the line and space image, but the present invention canalso be applied to a hole image by using a profile waveform of a holeimage in its diameter direction.

FIGS. 11A and 11B show relationships between focal positions and profilewaveforms of hole images. FIG. 11A is a case that a focus is on the holebottom surface and FIG. 11B is a case that a focus is on the hole uppersurface. Similar to the profile waveforms of the depressions of FIGS. 3Ato 3C, the inner skirt becomes steep when a focus is on the bottomsurface, and the inner skirt becomes gentle when a focus is on the uppersurface. In recent years, it is attempted to evaluate the hole bottomstate from the profile waveform, but if the profile waveform is notcalculated with the focal position set on the hole bottom surface asshown in FIGS. 11A and 11B, evaluation based on the waveform lacks inaccuracy. Therefore, in a case where the profile waveform is used toevaluate the hole bottom surface, it is necessary to use the method ofthe present invention to determine the focus value of the hole bottomsurface of the in-focus state and to photograph an image with its focusvalue.

It should be further understood by those skilled in the art thatalthough the foregoing description has been made on embodiments of theinvention, the invention is not limited thereto and various changes andmodifications may be made without departing from the spirit of theinvention and the scope of the appended claims.

1. A method for determining a convex or a concave part of a sample bydetecting charged particles emitted from the sample by scanning acharged particle beam, comprising: changing a focus position of thecharged particle beam; forming a plurality of line profiles, each lineprofile including a plurality of peaks which indicates an edge partlocated between a convex or concave part of the sample and the adjacentsurface, at the different focus positions; calculating, for differentfocus lengths, a plurality of first width values between one peak and anadjacent peak on one side; calculating, for different focus lengths, aplurality of second width values between the one peak and an adjacentpeak on the other side; comparing a first value among the plurality offirst width values, and a second value among the plurality of secondwidth values; determining that the convex part is located on the oneside of the one peak when the first value is smaller at a longer focuslength than the second value; and/or determining that the concave partis located on the one side of the one peak when the first value issmaller at a shorter focus length than the second value.
 2. The methodaccording to claim 1, wherein the detection of the charged particles isperformed on at least two focal positions, and a signal based on thedetected charged particles is used to determine the convex or theconcave part of the sample.
 3. A method for determining a convex or aconcave part of a sample by detecting the charged particles emitted froma sample by irradiation of a charged particle beam emitted from acharged particle source and determining the uneven surface of the samplebased on the detection of the charged particles, wherein: a plurality ofdeterminations are performed by the method for determining a convex or aconcave part of a sample according to claim
 1. 4. A sample measuringmethod for detecting the charged particles emitted from a sample byirradiation of a charged particle beam emitted from a charged particlesource, wherein the sample is measured according to the focal positionwhen a value subjected to measurement used for the determination of aconvex or a concave part of a sample according to claim 1 becomesminimum.
 5. A charged particle beam apparatus, comprising: a chargedparticle source, a scanning deflector for scanning a charged particlebeam emitted from the charged particle source on a sample, a lens forchanging a focus position of the charged particle beam emitted from thecharged particle source, a detector for detecting charged particlesemitted from the sample, and a computing section for processing a signalbased on the detected charged particles, wherein the computing section:forms a plurality of line profiles, each line profile including aplurality of peaks which indicates an edge part located between a convexor concave part of the sample and the adjacent surface, at the differentfocus positions; calculates, for different focus lengths, a plurality offirst width values between one peak and an adjacent peak on one side;calculates, for different focus lengths, a plurality of second widthvalues between the one peak and an adjacent peak on the other side ofthe one peak; determines that the convex part is located on the one sideof the one peak when the first value is smaller at a longer focus lengththan the second value; and/or determines that the concave part islocated on the one side of the one peak when the first value is smallerat a shorter focus length than the second value.
 6. The charged particlebeam apparatus according to claim 5, wherein: a template for specifyingthe convex or concave part of the sample and the measured results of theconvex or concave part are compared to determine a state of the convexor concave part of the sample.
 7. The charged particle beam apparatusaccording to claim 5, further comprising a means for displaying bysuperimposing the convex or concave part information of the sample onthe photographed image as a profile waveform.
 8. The charged particlebeam apparatus according to claim 5, wherein the obtained convex orconcave part information is used to specify the position of the sample.9. The charged particle beam apparatus according to claim 5, wherein animage or value obtained when autofocusing is used to calculate a signalor profile waveform used for determination.
 10. The charged particlebeam apparatus according to claim 5, wherein a convex or concave part ofthe scanned portion is determined, and pattern matching is performedaccording to the results of the convex or concave part determination.11. A non-transitory computer readable medium having executableinstructions stored thereon for determining a convex or a concave partof a sample by detecting charged particles emitted from the sample byscanning of a charged particle beam, which when executed by a computercause the computer to perform a method comprising steps of: changing afocus position of the charged particle beam; forming a plurality of lineprofiles, each line profile including a plurality of peaks whichindicates an edge part located between a convex or concave part of thesample and the adjacent surface, at the different focus positions;calculating, for different focus lengths, a plurality of first widthvalues between one peak and an adjacent peak on one side; calculating,for different focus lengths, a plurality of second width values betweenthe one peak and an adjacent peak on the other side; comparing a firstvalue among the plurality of first width values, and a second valueamong the plurality of second width values; determining that the convexpart is located on the one side of the one peak when the first value issmaller at a longer focus length than the second value; and/ordetermining that the concave part is located on the one side of the onepeak when the first value is smaller at a shorter focus length than thesecond value.
 12. A method for determining a convex or a concave part ofa sample by detecting charged particles emitted from the sample byscanning a charged particle beam, comprising: changing a focus positionof the charged particle beam to a first position by performing an autofocus; forming a first line profile which indicates an edge part locatedbetween a convex or concave part of the sample and the adjacent surfacebased on the charged particle beam focused to the first position;changing the focus position from the first position to a second positionwhich has a shorter focus length than the first position and/or a thirdposition which has a longer focus length than the first position;forming a second line profile which indicates an edge part locatedbetween a convex or concave part of the sample and the adjacent surfacebased on scanning the charged particle beam focused to the secondposition and/or the third position; calculating, for each of the firstand second line profiles, a first width on one side of the peak of theline profile; and determining that the convex part is located on the oneside of edge part when the first width of the peak formed at the secondposition is narrower than the first width of the peak formed at thefirst position, and/or when the first width of the peak formed at thethird position is wider than the first width of the peak formed at thefirst position.
 13. The method according to claim 12, wherein thedetermining that the convex part is located on the one side of edge partwhen a second width of the other side of the peak formed at the secondposition is wider than the second width of the peak formed at the firstposition, and/or when the second width of the peak formed at the thirdposition is narrower than the first width of the peak formed at thefirst position.
 14. A method for determining a convex or a concave partof a sample by detecting charged particles emitted from the sample byscanning a charged particle beam, comprising : changing a focus positionof the charged particle beam to a first position by performing an autofocus; forming a first line profile which indicates an edge part locatedbetween a convex or concave part of the sample and the adjacent surfacebased on the charged particle beam focused to the first position;changing the focus position from the first position to a second positionwhich has a shorter focus length than the first position and/or a thirdposition which has a longer focus length than the first position;forming a second line profile which indicates an edge part locatedbetween a convex or concave part of the sample and the adjacent surfacebased on scanning the charged particle beam focused to the secondposition and/or the third position; calculating, for each of the firstand second line profiles, a first width on one side of the peak of theline profile; and determining that the concave part is located on theone side of edge part when the first width of the peak formed at thesecond position is wider than the first width of the peak formed at thefirst position, and/or when the first width of the peak formed at thethird position is narrower than the first width of the peak formed atthe first position.
 15. The method according to claim 14, wherein thedetermining that the convex part is located on the one side of edge partwhen a second width of the other side of the peak formed at the secondposition is narrower than the second width of the peak formed at thefirst position, and/or when the second width of the peak formed at thethird position is wider than the first width of the peak formed at thefirst position.
 16. A charged particle beam apparatus, comprising: acharged particle source, a scanning deflector for scanning a chargedparticle beam emitted from the charged particle source on a sample, alens for changing a focus position of the charged particle beam emittedfrom the charged particle source between a first position determined byperforming an auto focus, a second position which has a shorter focuslength than the first position, and a third position which has a longerfocus length than the first position, a detector for detecting chargedparticles emitted from the sample, and a computing section forprocessing a signal based on the detected charged particles, wherein thecomputing section: forms a first line profile which indicates an edgepart located between a convex or concave part of the sample and theadjacent surface based on the charged particle beam focused to the firstposition; forms a second line profile which indicates an edge partlocated between a convex or concave part of the sample and the adjacentsurface based on scanning the charged particle beam focused to thesecond position and/or the third position; calculates, for each of thefirst and second line profiles, a first width on one side of the peak ofthe line profile; and determines that the convex part is located on theone side of edge part when the first width of the peak formed at thesecond position is narrower than the first width of the peak formed atthe first position, and/or when the first width of the peak formed atthe third position is wider than the first width of the peak formed atthe first position.
 17. The apparatus according to claim 16, wherein thedetermining that the convex part is located on the one side of edge partwhen a second width of the other side of the peak formed at the secondposition is wider than the second width of the peak formed at the firstposition, and/or when the second width of the peak formed at the thirdposition is narrower than the first width of the peak formed at thefirst position.
 18. A charged particle beam apparatus, comprising: acharged particle source, a scanning deflector for scanning a chargedparticle beam emitted from the charged particle source on a sample, alens for changing a focus position of the charged particle beam emittedfrom the charged particle source between a first position determined byperforming an auto focus, a second position which has a shorter focuslength than the first position, and a third position which has a longerfocus length than the first position, a lens for changing a focusposition of the charged particle beam emitted from the charged particlesource, a detector for detecting charged particles emitted from thesample, and a computing section for processing a signal based on thedetected charged particles, wherein the computing section: forms a firstline profile which indicates an edge part located between a convex orconcave part of the sample and the adjacent surface based on the chargedparticle beam focused to the first position; forms a second line profilewhich indicates an edge part located between a convex or concave part ofthe sample and the adjacent surface based on scanning the chargedparticle beam focused to the second position and/or the third position;calculates, for each of the first and second line profiles, a firstwidth on one side of the peak of the line profile; and determines thatthe concave part is located on the one side of edge part when the firstwidth of the peak formed at the second position is wider than the firstwidth of the peak formed at the first position, and/or when the firstwidth of the peak formed at the third position is narrower than thefirst width of the peak formed at the first position.
 19. The methodaccording to claim 18, wherein the determining that the convex part islocated on the one side of edge part when a second width of the otherside of the peak formed at the second position is narrower than thesecond width of the peak formed at the first position, and/or when thesecond width of the peak formed at the third position is wider than thefirst width of the peak formed at the first position.
 20. Anon-transitory computer readable medium having executable instructionsstored thereon for determining a convex or a concave part of a sample bydetecting charged particles emitted from the sample by scanning of acharged particle beam, which when executed by a computer cause thecomputer to perform a method comprising steps of: changing a focusposition of the charged particle beam to a first position by performingan auto focus; forming a first line profile which indicates an edge partlocated between a convex or concave part of the sample and the adjacentsurface based on the charged particle beam focused to the firstposition; changing the focus position from the first position to asecond position which has a shorter focus length than the first positionand/or a third position which has a longer focus length than the firstposition; forming a second line profile which indicates an edge partlocated between a convex or concave part of the sample and the adjacentsurface based on scanning the charged particle beam focused to thesecond position and/or the third position; calculating, for each of thefirst and second line profiles, a first width on one side of the peak ofthe line profile; and determining that the convex part is located on theone side of edge part when the first width of the peak formed at thesecond position is narrower than the first width of the peak formed atthe first position, and/or when the first width of the peak formed atthe third position is wider than the first width of the peak formed atthe first position.
 21. The non-transitory computer readable mediumaccording to claim 20, wherein the determining that the convex part islocated on the one side of edge part when a second width of the otherside of the peak formed at the second position is wider than the secondwidth of the peak formed at the first position, and/or when the secondwidth of the peak formed at the third position is narrower than thefirst width of the peak formed at the first position.
 22. Anon-transitory computer readable medium having executable instructionsstored thereon for determining a convex or a concave part of a sample bydetecting charged particles emitted from the sample by scanning acharged particle beam, which when executed by a computer cause thecomputer to perform a method comprising steps of: changing a focusposition of the charged particle beam to a first position by performingan auto focus; forming a first line profile which indicates an edge partlocated between a convex or concave part of the sample and the adjacentsurface based on the charged particle beam focused to the firstposition; changing the focus position from the first position to asecond position which has a shorter focus length than the first positionand/or a third position which has a longer focus length than the firstposition; forming a second line profile which indicates an edge partlocated between a convex or concave part of the sample and the adjacentsurface based on scanning the charged particle beam focused to thesecond position and/or the third position; calculating, for each of thefirst and second line profiles, a first width on one side of the peak ofthe line profile; and determining that the concave part is located onthe one side of edge part when the first width of the peak formed at thesecond position is wider than the first width of the peak formed at thefirst position, and/or when the first width of the peak formed at thethird position is narrower than the first width of the peak formed atthe first position.
 23. The non-transitory computer readable mediumaccording to claim 22, wherein the determining that the convex part islocated on the one side of edge part when a second width of the otherside of the peak formed at the second position is narrower than thesecond width of the peak formed at the first position, and/or when thesecond width of the peak formed at the third position is wider than thefirst width of the peak formed at the first position.